Sr. OPC-RET Engineer Optical Proximity Correction lithography up to 130k base, multiple openings

Benefits - Full
Relocation Assistance Available - Yes

This position will develop and qualify Optical Proximity Correction (OPC) technology on 22nm node and beyond. He or She will also transfer and enable OPC solutions in manufacturing. Candidate should possess strong lithography/OPC knowledge, in FEOL and/or BEOL; and good understanding of high performance CMOS patterning/design integration. Candidate should be experienced on lithography/OPC process development and must be capable of collaborating with upstream and downstream development teams. Previous technology development and transfer experience is a plus.

Specific Responsibilities

•Primary responsibility of this position is to develop OPC technology for 22nm and beyond generations. Candidates should have working knowledge of Lithography, OPC (both modeling and correction), mask data prep, and design rules.
•Candidate for this position must be self-motivated and is capable of driving development projects with minimum supervision. Candidate will be required to work well within an alliance team for technology development, and also within a internal team for technology transfer and enablement.

Required Qualifications

•BS degree, minimum 6 years or Masters plus 5 years or PhD plus minimum 3 years industry-related engineering or science degree.
•5 or more years of lithography and/or OPC experience.
•Working knowledge of industrial grade OPC/Lithography software.

Desired Qualifications

•Fundamental understanding of lithography and OPC processes, and lithography/OPC integration is required, and additional technical experience in lithography flow, OPC flow, and mask flow is a plus.
5+ to 7 years of experience